Load/Expose

Take a humorous tumble through the process and terminology of film processing. Rich pen and ink drawings fill each page, creating a lush journey through the fine art of photography.

Book Price: $65
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Total: $80.00

Images

Holdings

University of Utah, Cleveland Institute of Art, Amherst College, University of New Mexico (Albuquerque), Stanford University, Washington University (St. Louis), Messiah College, University of Louisville, University of Delaware, Yale University, Rochester Institute of Technology, Le Monde En Tique, University of Arizona (Tucson), Virginia Commonwealth University, Vassar College Library, CalArts (California Institute of the Arts), Indiana University, Museum of Modern Art, University of Michigan, Library of Congress, University of California (Los Angeles), Otis College of Art and Design, Ohio University, Scripps College, Bucknell University

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Metadata

Title:

Load/Expose

Date of publication:

1990

Place of publication:

Rosendale, NY

Publisher:

Women's Studio Workshop

Subjects:

Photography--Processing

Dimensions:

22 x 26 cm.

Number in edition:

100

Paging:

[17] p.

Printing method:

Two color silkscreen

Binding:

Saddle stitch pamphlet

Structure:

Codex

Funding source:

New York State Council on the Arts, Women's Studio Workshop

Printer:

Nancy Chalker-Tennant

Binder:

Nancy Chalker-Tennant